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Effect of substrate and annealing on the structural and optical properties of ZnO:Al films |
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| Authors: | Jijun Ding Xinggang Zhao |
| Institution: | a College of Physics and Electronics Engineering, Northwest Normal University, Lanzhou 730070, China b Joint Laboratory of Atomic and Molecular Physics, NWNU & IMP CAS, Lanzhou 730070, China c Physics Department, Dingxi Normal College, Dingxi 743000, China |
| Abstract: | ZnO:Al thin films with c-axis preferred orientation were deposited on glass and Si substrates using RF magnetron sputtering technique. The effect of substrate on the structural and optical properties of ZnO:Al films were investigated. The results showed a strong blue peak from glass-substrate ZnO:Al film whose intensity became weak when deposited on Si substrate. However, the full width at half maxima (FWHM) of the Si-substrate ZnO:Al (0 0 2) peaks decreased evidently and the grain size increased. Finally, we discussed the influence of annealing temperature on the structural and optical properties of Si-substrate ZnO:Al films. After annealing, the crystal quality of Si-substrate ZnO:Al thin films was markedly improved and the intensity of blue peak (∼445 nm) increased noticeably. This observation may indicate that the visible emission properties of the ZnO:Al films are dependent more on the film crystallinity than on the film stoichiometry. |
| Keywords: | A Semiconductors A Thin films C X-ray diffraction D Optical properties |
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