Photoinduced unzipping depolymerization of poly(olefin sulfone)s possessing photobase generator and base amplifier |
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Authors: | Takeo Sasaki Hiroaki Yaguchi |
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Affiliation: | Department of Chemistry, Faculty of Science, Tokyo University of Science, 1‐3 Kagurazaka, Shinjuku‐ku, Tokyo 162‐8601, Japan |
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Abstract: | The photoinduced depolymerization of poly(olefin sulfone)s was investigated. Poly(olefin sulfone)s possessing base‐amplifying groups were synthesized. A photobase‐generating compound was mixed with poly(olefin sulfone)s and irradiated with 254 nm UV light. The decomposition ratio was significantly enhanced in poly(olefin sulfone)s that possessed base‐amplifying groups. © 2008 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 47: 602–613, 2009 |
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Keywords: | base amplifier degradation lithography photobase generator photoinduced depolymerization photoreactive effects poly(olefin sulfone)s |
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