Surface functionalization with phosphazene substrates—part VII. Silicon‐based materials functionalized with hexachlorocyclophosphazene

This paper investigates by means of XPS analysis the surface functionalization of soda‐lime and fused quartz glass substrates with hexachlorocyclophosphazene (HCCP), obtained by simple immersion in solutions of phosphazene in anhydrous solvents. Several experimental parameters like reaction solvent, temperature and treatment duration were studied, together with the influence of physisorbed water on the surface of the substrates. Phosphazene‐derived deposits resistant to tetrahydrofuran (THF) washing and vacuum drying were obtained. They presented P:N:Cl stoichiometric ratios close to 1:1:1 when the reaction and the final drying of the samples were performed at room temperature; use of higher temperatures resulted in lower nitrogen and chlorine content. The chemical nature of the films was studied by XPS peaks deconvolution which enabled us to propose a possible, temperature‐enhanced hydrolytical degradation mechanism. Copyright © 2008 John Wiley & Sons, Ltd.