| 0.87Na0.5Bi0.5TiO3-0.13PbTiO3薄膜的MOSD+Dipping制备 |
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| 引用本文： | 王卓,杨长红,王民,房昌水.0.87Na0.5Bi0.5TiO3-0.13PbTiO3薄膜的MOSD+Dipping制备[J].人工晶体学报,2004,33(5):817-819. |
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| 作者姓名： | 王卓 杨长红 王民 房昌水 |
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| 作者单位： | 山东大学晶体材料国家重点实验室,济南,250100 |
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| 摘 要： | 采用MOSD+Dipping方法在P型Si(111)衬底上制备了0.87Na0.5Bi0.5TiO3-0.13PbTiO3薄膜.用X射线衍射技术研究了薄膜的结构和结晶性.用原子力显微镜分析了薄膜的表面形貌.同时还研究了薄膜的存储性能.
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| 关 键 词： | MOSD+Dipping法 C-V曲线 铁电薄膜 |
| 文章编号： | 1000-985X(2004)05-0817-03 |
Preparation of 0.87 Na0.5Bi0.5TiO3-0.13PbTiO3 Thin Films by MOSD+Dipping Method |
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| WANG Zhuo,YANG Chang-hong,WANG Min,FANG Chang-shui.Preparation of 0.87 Na0.5Bi0.5TiO3-0.13PbTiO3 Thin Films by MOSD+Dipping Method[J].Journal of Synthetic Crystals,2004,33(5):817-819. |
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| Authors: | WANG Zhuo YANG Chang-hong WANG Min FANG Chang-shui |
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| Abstract: | 0.87 Na0.5Bi0.5TiO3 -0.13PbTiO3 thin films have been grown on P-Si(111) substrates by MOSD + Dipping method. The structural characteristic and crystallization of the films were examined by X-ray diffraction (XRD) . The surface morphologies of the films were examined by atomic force microscopy (AFM). The memory effect of the films was also studied. |
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| Keywords: | MOSD+ Dipping method C-V curve ferroelectric thin films |
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