Germania/ormosil hybrid materials derived at low temperature for photonic applications |
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Authors: | WX Que X Hu QY Zhang |
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Institution: | (1) School of Materials Engineering, Nanyang Technological University, Singapore 639798, SG;(2) School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore 639798, SG |
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Abstract: | We report on germania/organically modified silane (ormosil) hybrid materials produced by the sol–gel technique for photonic
applications. Acid-catalyzed solutions of γ-glycidoxypropyltrimethoxysilane mixed with germanium isopropoxide have been used
as precursors for the hybrid materials. Planar waveguide films with a thickness of about 2 μm have been prepared by a single
spin-coating process and low-temperature heat treatment from these high germanium content hybrid materials. Atomic force microscopy,
thermal gravimetric analysis, UV–visible spectroscopy, and Fourier-transform infrared spectroscopy have been used to investigate
the optical and structural properties of the films. The results have indicated that a dense, low absorption, and high transparency
(in the visible range) waveguide film could be achieved at a low temperature. A strong UV-absorption region at short wavelengths
∼200 nm, accompanied by a shoulder peaked at ∼240 nm, has been noticed due to the neutral oxygen monovacancy defects. The
propagation mode and loss properties of the planar waveguide films have also been investigated by using a prism-coupling technique.
Received: 5 November 2002 /
Revised version: 27 December 2002 / Published online: 19 March 2003
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ID="*"Corresponding author. Fax: +65-67909081, E-mail: ewxque@ntu.edu.sg |
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Keywords: | PACS: 81 05 Pj 81 20 Fw 78 66 Sq |
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