Determination of total As in onion plants growing in contaminated substrates by total reflection X-ray fluorescence

The onion (Allium cepa L.) is one of the most important cultivars in the world and its production level occupies the second place in Venezuela. It becomes important to develop analytical procedures for arsenic determination and to study the effect of this element on the cultures, as well the absorption, transport and translocation processes. A TXRF method for As determination in onions was developed. Two treatments were applied to the onion plants, As contaminated and control. The contaminant was added to the plants to an amount of 100 μg, in a single time 3 weeks after the transplant of plantlets. The green leaves bulbs, and roots together with the stems were separated 45 days after transplant and analyzed by TXRF and HG-AAS for total Arsenic determination. A good agreement was found between these two techniques, demonstrating the accuracy of the TXRF procedure. It was found that the highest concentration corresponded to the root and stems (37 ± 31 μg g⁻¹), followed by the bulbs (11 ± 7 μg g⁻¹), being the smallest level found in the green leaves (4 ± 3 μg g⁻¹). At low As contamination levels of 0.25 μg g⁻¹, a risk for translocation of the toxic element to the edible parts of the onion plants exists. At this level the normal development of the plant is not affected, being the only exception the root length, which is significantly higher in the contaminated treatment.