| Reactions of Thienyl Containing Trisilane Under Irradiation |
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| 作者姓名： | WU Shi-Hui QIAN Hu WU Ge JIANG Nan |
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| 作者单位： | WU Shi-Hui;QIAN Hu;WU Ge;JIANG Nan Department of Chemistry，Fudan University，200433 Shanghai
Current address: Dept. of Chem. UCLA，Los Angeles. CA 90024. Current address: Dept. of Chem. Washington Univ.，St. Louis MO 63130. |
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| 基金项目： | This work was supported by Chinese National Natural Sciences Foundation |
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| 摘 要： | 2-phenyl-2-furylhexamethyltrisilane and 2-phenyl-2-thienylhexamethyltrisilane (1) weresynthesized via Grignard-like reactions. The photolysis of 2-phenyl-2-furylhexamethyltrisilane inthe presence of 2,3-dimethyl-1,3-butadiene led to normal silylene-olefin addition and silylene C-Hinsertion reactions. Whereas, when 1 was photolyzed in the methanol-cyclohexene system, a radicalreaction mechanism is occurred. We suspect that the sulfur atom of the thienyl group strongly stabi-lized the silyl radical. This result was supported by both identifyling its typical radical reactions prod-ucts and ESR spectra of its quenching product with radical quencher.
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Reactions of Thienyl Containing Trisilane Under Irradiation |
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| WU Shi-Hui,QIAN Hu,WU Ge,JIANG Nan.Reactions of Thienyl Containing Trisilane Under Irradiation[J].Chinese Journal of Organic Chemistry,1993(3). |
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| Authors: | WU Shi-Hui QIAN Hu WU Ge JIANG Nan |
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| Institution: | WU Shi-Hui,QIAN Hu,WU Ge,JIANG Nan Department of Chemistry,Fudan University,200433 Shanghai
Current address: Dept. of Chem. UCLA,Los Angeles. CA 90024. Current address: Dept. of Chem. Washington Univ.,St. Louis MO 63130. |
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| Abstract: | 2-phenyl-2-furylhexamethyltrisilane and 2-phenyl-2-thienylhexamethyltrisilane (1) weresynthesized via Grignard-like reactions. The photolysis of 2-phenyl-2-furylhexamethyltrisilane inthe presence of 2,3-dimethyl-1,3-butadiene led to normal silylene-olefin addition and silylene C-Hinsertion reactions. Whereas, when 1 was photolyzed in the methanol-cyclohexene system, a radicalreaction mechanism is occurred. We suspect that the sulfur atom of the thienyl group strongly stabi-lized the silyl radical. This result was supported by both identifyling its typical radical reactions prod-ucts and ESR spectra of its quenching product with radical quencher. |
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| Keywords: | free radical photolysis trisilane mechanism |
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