Room temperature ferromagnetism in vacuum-annealed TiO2 thin films |
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| Authors: | C. Sudakar P. Kharel R. Suryanarayanan J.S. Thakur V.M. Naik R. Naik G. Lawes |
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| Affiliation: | 1. Department of Physics and Astronomy, Wayne State University, Detroit, MI, USA;2. Laboratoire de Physico-Chimie de l’Etat Solide, ICMMO-UMR CNRS 8182, Université Paris-Sud, Orsay, France;3. Department of Electrical and Computer Engineering, Wayne State University, Detroit, MI, USA;4. Department of Natural Sciences, University of Michigan Dearborn, Dearborn, MI, USA |
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| Abstract: | Thin films of pure TiO2 have been prepared using both spin-coating and sputter-deposition techniques on sapphire and quartz substrates. The structural characteristics of the films have been investigated in detail using Raman spectroscopy and high-resolution transmission electron microscopy (HRTEM). When annealed in vacuum, all films demonstrate room temperature ferromagnetism, while the air-annealed samples show much smaller, often negligible, magnetic moments. The magnetization of the vacuum-annealed sputtered samples depends on film thickness, with the volume magnetization decreasing monotonically with increasing thickness. Furthermore, the magnetization per unit area also decreases slightly with increasing film thickness. These results suggest that ferromagnetism in the vacuum-annealed TiO2 films is mediated by surface defects or interfacial effects, but does not arise from stoichiometric crystalline TiO2. |
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| Keywords: | Magnetic semiconductor TiO2 Thin films |
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