Structure,magnetic properties and magnetostriction of Fe81Ga19 thin films |
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Authors: | BW Wang SY Li Y Zhou WM Huang SY Cao |
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Institution: | 1. Research Center of Magnetic Technique and Magnetic Materials, Hebei University of Technology, Tianjin 300130, China;2. International Center for Materials Physics, Academia Sinica, Shenyang 110015, China |
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Abstract: | The structure, magnetic properties and magnetostriction of Fe81Ga19 thin films have been investigated by using X-ray diffraction analysis, scanning electron microscope (SEM), vibrating sample magnetometer and capacitive cantilever method. It was found that the grain size of as-deposited Fe81Ga19 thin films is 50–60 nm and the grain size increases with increase in the annealing temperature. The remanence ratio (Mr/Ms) of the thin films slowly decreases with increase in the annealing temperature. However, the coercivity of the thin films goes the opposite way with increase in the annealing temperature. A preferential orientation of the Fe81Ga19 thin film fabricated under an applied magnetic field exists along 〈1 0 0〉 direction due to the function of magnetic field during sputtering. An in-plane-induced anisotropy of the thin film is well formed by the applied magnetic field during the sputtering and the formation of in-plane-induced anisotropy results in 90° rotations of the magnetic domains during magnetization and in the increase of magnetostriction for the thin film. |
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Keywords: | 75 8 +q |
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