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Studies of the chemically amplified development-free vapor photolithography |
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| Authors: | Jianping Lu Xiaoyin Hong Bing Wu Peiqing Wang Yongqi Chen |
| Institution: | a Chemistry Department, Tsinghua University, Beijing 100084, People's Republic of China b The Power Electronic Devices Factory of Tsinghua University, Beijing 100084, People's Republic of China |
| Abstract: | Development-free vapor photolithography (DFVP) is a unique all-dry pattern transfer technique, which is based on the reaction of SiO2 with HF vapor under a polymer film in the presence of accelerators at a temperature of above 100°C. In this paper, we found that the etching reaction could be catalyzed by superacids. Based on this discovery, a novel, chemically amplified, development-free vapor photolithography technique was developed, and has benn successfully applied to power electronic device manufacture. |
| Keywords: | Development-free vapour photolithography Chemical amplification Diphenyliodonium salts Photosensitizer |
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