Characterization of patterned poly(methyl methacrylate) brushes under various structures upon solvent immersion |
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| Authors: | Jem-Kun Chen Chih-Yi Hsieh Chih-Feng Huang Po-min Li |
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| Affiliation: | aDepartment of Polymer Engineering, National Taiwan University of Science and Technology, 43, Sec 4, Keelung Rd, Taipei, 106 Taiwan, People’s Republic of China;bDepartment of Biomechatronics Engineering, National Pingtung University of Science and Technology, PingTung, Taiwan;cDepartment of Applied Chemistry, National Chiao Tung University, Hsinchu, Taiwan |
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| Abstract: | In this paper we describe a graft polymerization/solvent immersion method for generating various patterns of polymer brushes. We used a very-large-scale integration (VLSI) process and oxygen plasma system to generate well-defined patterns of polymerized methyl methacrylate (MMA) on patterned Si(1 0 0) surfaces through atom transfer radical polymerization (ATRP). After immersion of wafers presenting lines of these PMMA brushes in water and tetrahydrofuran, we observed mushroom- and brush-like regimes through grafting densities and surface coverages, respectively, for the PMMA brushes with various pattern resolutions. In the mushroom-like regime, the distance between lines of PMMA brushes was smaller than that of the lines patterned lithographically on the wafer; in the brush-like regime, this distance was approximately the same. This new strategy allows polymer brushes to be prepared through graft polymerization and then have their patterns varied through solvent immersion. |
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| Keywords: | ATRP Grafting density Surface coverage Very-large-scale integration PMMA brush |
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