Studies on catalytically active surface compounds, IX. Formation of O2? radicals on VCl4/SiO2 catalysts |
| |
| Authors: | R Fricke H -G Jerschkewitz V B Kazanskii V A Shvets and G Öhlmann |
| |
| Institution: | (1) Central Institute of Physical Chemistry, Academy of Sciences of the GDR, Berlin-Adlershof, GDR;(2) Zelinskii Institute of Organic Chemistry, Academy of Sciences of the USSR, Moscow, USSR |
| |
| Abstract: | The conditions for the formation of O
2
–
on VCl4/SiO2 catalysts have been investigated. It is shown that thermal vacuum treatment (TVT) of unhydrolyzed catalysts leads to partial hydrolysis of the surface vanadium complex caused by the silanol groups of the support. The ability of the catalysts to generate O
2
–
radicals was found to depend on the degree of hydrolysis caused by thermal vacuum treatment.
                O
2
–
   VCl4/SiO2.  ,    ,  .  , O
2
–
, .
|
| |
| Keywords: | |
| 本文献已被 SpringerLink 等数据库收录！ |
|
