Titanium Oxide Film Deposition on Acrylic Resin by Atmospheric TPCVD

A dye-sensitized solar cell (DSC) is a solar cell that uses an anatase film as a photovoltaic device. Since the anatase film and dye play the roles of electron carrier and electron generator, respectively, in the DSC, porous anatase films are desirable. In this paper, in order to develop a low-cost fabrication process for the photovoltaic device of the DSC, photocatalytic titanium oxide film deposition was carried out by atmospheric thermal plasma CVD. Ar gas, which served as the working gas for the plasma jet and substrate, and a 20 $times$ 40 $times$ 3 mm transparent acrylic resin plate were used. Titanium tetra iso butoxide was used as feedstock. Consequently, by cooling the substrate, an anatase-dominant film could be deposited at 773 K in deposition temperature without meltdown of the substrate on the condition of 100 mm in deposition distance, even in the case of acrylic resin substrate use. By wettability and methylene-blue decoloration tests, it was confirmed that the film showed hydrophilic and decolored methylene blue perfectly by 8-h UV irradiation. Furthermore, the DSC in which the titanium oxide film deposited by this technique was included as a photovoltaic device generated a photoelectromotive force of 25 mV. From these results, these thermal plasma processes were found to have high potential for DSC fabrication.