Rational construction of self-assembly azobenzene derivative monolayers with photoswitchable surface properties |
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Authors: | Yu Zhang Peng Gao Qin Yue Peter Trefonas Yonghui Deng |
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Affiliation: | 1. Department of Chemistry, State Key Laboratory of Molecular Engineering of Polymers, Shanghai Key Laboratory of Molecular Catalysis and Innovative Materials, iChEM, Fudan University, Shanghai 200433, China;2. Dow Chemical (China) Investment Company, Shanghai 201203, China;3. Rohm & Haas Electronic Materials LLC, Marlborough, MA 01752, United States;4. State Key Laboratory of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China |
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Abstract: | Photo-responsive azobenzene (ABZ) derivatives with different end groups (R) as photoswitchable molecules were employed to construct self-assembled monolayers (SAMs) on silicon substrate by using 3-glycidoxypropyltrimethoxysilane (GPTS) as the bridging molecules. The assembly process was optimized by changing various parameters, including the type and concentration of ABZ derivatives, reaction time, etc. The obtained SAMs were fully characterized and evaluated using UV spectroscopy, atomic force microscope (AFM), elllipsometer, static contact angle and X-ray photoelectron spectroscopy (XPS). It is found that the end group property of azobenzene derivatives is critical to the obtained SAMs’ photoresponsive properties. Compared with hydrophobic compounds (4-(4′-aminophenylazo) benzoic acid, ABZ-CF3), the hydrophilic compounds (4-(4′-aminophenylazo) benzoic acid, ABZ-COOH) show excellent reversible photoswitching performance with a large contact angle change of 35° under optimized process, and the SAMs are removable by thermal treatment at 240 °C in air for only 5 min. |
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Keywords: | Self-assembly Monolayer Azobenzene Photoswitch Surface treatment |
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