Synthesis of poly(4‐hydroxystyrene)‐based block copolymers containing acid‐sensitive blocks by living anionic polymerization |
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Authors: | Daniel P. Sweat Xiang Yu Myungwoong Kim Padma Gopalan |
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Affiliation: | 1. Department of Chemistry, University of Wisconsin, , Madison, Wisconsin, 53706;2. Department of Materials Science and Engineering, University of Wisconsin, , Madison, Wisconsin, 53706 |
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Abstract: | Living anionic polymerization of an acetal protected 4‐hydroxystyrene monomer, (4‐(2‐tetrahydropyranyloxy)styrene) (OTHPSt), and the chain extension of the poly(OTHPSt) anion with a variety of monomers including styrene, 4‐tert‐butylstyrene, methacryloyl polyhedral oligomeric silsesquioxane (MAPOSS) and hexamethylcyclotrisiloxane is demonstrated. The P(OTHPSt) homopolymer has a glass transition temperature well above room temperature, which facilitates handling and purification of the protected poly(4‐hydroxystyrene) (PHS). The resulting diblock copolymers have narrow dispersities <1.05. Chemoselective mild deprotection conditions for the P(OTHPSt) block were identified to prevent simultaneous degradation of the MAPOSS or dimethylsiloxane (DMS) block, thus allowing for the first reported synthesis of P(HS‐b‐DMS) and P(HS‐b‐MAPOSS). © 2014 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2014 , 52, 1458–1468 |
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Keywords: | anionic polymerization block copolymers polysiloxanes polystyrene |
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