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Dynamic low-temperature scanning force microscopy on nickel oxide (001)
Authors:W. Allers   S. Langkat  R. Wiesendanger
Affiliation:(1) Department of Electronic Engineering, Osaka University, Yamada-Oka 2-1, 565-0871 Suita-Citiy, Osaka, Japan;(2) Lehrstuhl f?r Experimentalphysik VI, Universit?t Augsburg, Universit?tsstra?e 1, 86135 Augsburg, Germany;(3) Department of Applied Physics, Osaka University, Yamada-Oka 2-1, 565-0871 Suita, Japan;(4) Japan Science and Technology Corporation, Innovation Plaza, Hokkaido, 060-0819 Sapporo, Japan;(5) Nanoelectronics Laboratory, Hokkaido University, Nishi-8, Kita-13, Kita-ku, 060-8628 Sapporo, Japan;(6) Surface Chemistry Laboratory, Kanagawa Academy of Science and Technology, KSP East 404, 3-2-1 Sakado, Takatsu-ku, Kawasaki-shi, 213-0012 Kanagawa, Japan;(7) Surface Chemistry Laboratory, Kanagawa Academy of Science and Technology, KSP East 404, 3-2-1 Sakado, Takatsu-ku, Kawasaki-shi, 213-0012 Kanagawa, Japan
Abstract:We present atomically resolved images of nickel oxide (001) obtained with low temperature non-contact atomic force microscopy. Using iron coated silicon cantilevers, it is possible to distinguish defects with a vertical resolution of less than 10 pm and to obtain atomic resolution across step edges on the upper and lower terrace within 1 nm of the edge. The noise level in these images could be reduced to ƹ.5 pm.
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