Selective epitaxy and lateral overgrowth of 3C-SiC on Si – A review

This review article attempts to present a comprehensive picture of the progress in selective epitaxial growth (SEG) of cubic silicon carbide (3C-SiC) to make it a cheap and practical material for high temperature and high power, high frequency and MEMS (Micro Electromechanical Systems) applications. Selective epitaxial growth followed by epitaxial lateral overgrowth (ELO) is a suitable approach to minimize the interfacial defects and other planar defects in case of thin film growth. Different techniques of SEG and its application to Si, GaAs and III–V nitrides are reviewed briefly in the first section of this article. Various SEG techniques like epitaxial lateral overgrowth, pyramidal growth and pendeo epitaxial growth, etc. have been discussed extensively for growing 3C-SiC on Si, together with the characterization of the grown films. The influence of various experimental parameters such as temperature of growth, choice of mask material, influence of an etchant, pattern shape and size, etc. is also discussed. On the basis of these data, it is believed that SEG and related techniques are a promising approach for heteroepitaxial growth of 3C-SiC films useful for devices and MEMS applications.