| 类金刚石和碳氮薄膜的电化学沉积及其场发射性能研究 |
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| 引用本文： | 叶凡,谢二庆,李瑞山,林洪峰,张军,贺德衍.类金刚石和碳氮薄膜的电化学沉积及其场发射性能研究[J].物理学报,2005,54(8):3935-3939. |
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| 作者姓名： | 叶凡 谢二庆 李瑞山 林洪峰 张军 贺德衍 |
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| 作者单位： | 兰州大学物理科学与技术学院，兰州 730000 |
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| 摘 要： | 利用电化学方法在室温下成功地沉积了类金刚石(DLC)薄膜和非晶CNx薄膜，并 对制备条件进行了讨论.通过扫描电子显微镜、傅里叶变换红外光谱技术，分析了薄膜的表面形貌和化学结合状态.场发射测量结果表明：DLC膜和非晶CNx的开启场分别为88和 10V/μm；并且在23V/μm的电场下，DLC膜和非晶CNx膜的发射电流密度分别达到10 和037mA/cm2.
关键词：
电化学沉积
类金刚石薄膜
x薄膜')" href="#">CNx薄膜
场致电子发射
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| 关 键 词： | 电化学沉积 类金刚石薄膜 CNx薄膜 场致电子发射 |
| 文章编号： | 1000-3290/2005/54(08)/3935-05 |
| 收稿时间： | 2004-09-20 |
Field emission properties of diamond-like carbon and carbon nitride films deposited by the electrochemical method |
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| Ye Fan,XIE Er-qing,LI Rui-shan,Lin Hong-Feng,Zhang Jun,HE DE-YAN.Field emission properties of diamond-like carbon and carbon nitride films deposited by the electrochemical method[J].Acta Physica Sinica,2005,54(8):3935-3939. |
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| Authors: | Ye Fan XIE Er-qing LI Rui-shan Lin Hong-Feng Zhang Jun HE DE-YAN |
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| Abstract: | Diamond-like carbon (DLC) and carbon nitride (CNx) films were deposit ed successfully by the electrochemical method.The conditions of deposition were discussed also.Scanning electron microscope and Fourier transform infrared technigue were used to investigate the surface morphology and the bonding structure.The results of the field emission show that the turn-on fields of DLC films and CNx films are 88 and 10V/μm respectively.Under the field of 23V/μm,their current densities are as high as 10 and 037 mA/cm2, respectively . |
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| Keywords: | electrochemical deposition diamond-like carbon films CNx films ele ctron field emission |
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