| 水浴条件下YAG倍频、三倍频激光切割Si片比较 |
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| 引用本文： | 凌磊,楼祺洪,李抒智,叶震寰,马海霞,董景星. 水浴条件下YAG倍频、三倍频激光切割Si片比较[J]. 光子学报, 2005, 34(3): 340-342 |
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| 作者姓名： | 凌磊 楼祺洪 李抒智 叶震寰 马海霞 董景星 |
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| 作者单位： | 中国科学院上海光学与精密机械研究所,上海,201800;中国科学院上海光学与精密机械研究所,上海,201800;中国科学院上海光学与精密机械研究所,上海,201800;中国科学院上海光学与精密机械研究所,上海,201800;中国科学院上海光学与精密机械研究所,上海,201800;中国科学院上海光学与精密机械研究所,上海,201800 |
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| 基金项目： | 国家自然科学重点基金(10334110)资助项目 |
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| 摘 要： | 对Nd∶YAG固体激光器倍频、三倍频激光输出在空气和水浴环境下刻蚀Si片进行了研究，分析了刻蚀速率和样品表面形貌，得出了在355 nm刻蚀波长下，水浴环境中，刻蚀速率最快，刻槽宽度最小，小于10 μm的实验结论，为工业应用提供参考.
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| 关 键 词： | YAG固体倍频激光 切割 Si片 水浴 |
| 收稿时间： | 2004-01-19 |
| 修稿时间： | 2004-01-19 |
Microcutting Si Wafer in Water Bath by the Second and Third Harmonic Output of YAG Laser |
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| Ling Lei,Lou Qihong,Li Shuzhi,Ye Zhenghuan,Ma Haixia,Dong Jingxing. Microcutting Si Wafer in Water Bath by the Second and Third Harmonic Output of YAG Laser[J]. Acta Photonica Sinica, 2005, 34(3): 340-342 |
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| Authors: | Ling Lei Lou Qihong Li Shuzhi Ye Zhenghuan Ma Haixia Dong Jingxing |
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| Affiliation: | Shanghai Institute of Optics and Fine Mechanics, Shanghai 201800 |
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| Abstract: | It is reported that the slot of microcutting Si wafer by second and third harmonic output of YAG laser is narrower in water bath than in air environment. The surface morphology and etching rate for water bath and air environment are compared in detail. The cutting gap as small as 10 μm with edge fluctuation less than 5 μm is obtained in water bath by 355 nm laser. This technology may be helpful for industrial applications. |
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| Keywords: | Harmonic output of YAG laser microcutting Si wafer Water bath |
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