| 激光化学气相沉积法制备TiO2薄膜 |
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| 引用本文： | 孙利平,邓辉球,刘晓芝,佘彦武,黄飞江. 激光化学气相沉积法制备TiO2薄膜[J]. 激光与光电子学进展, 2007, 44(8): 57-61 |
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| 作者姓名： | 孙利平 邓辉球 刘晓芝 佘彦武 黄飞江 |
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| 作者单位： | 长沙大学电子与通信工程系,长沙,410003;湖南大学物理与微电子科学学院,长沙,410082 |
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| 摘 要： | 利用激光化学气相沉积(LCVD)方法,以钛金属有机化合物为前驱体,以O2为反应气体,在激光功率PL为0～200 w、基板预热温度为400～700℃的条件下,制备出了金红石型TiO2薄膜和金红石型与锐钛矿型混合TiO2薄膜.研究表明,激光功率和基板预热温度对所沉积的TiO2薄膜的物相组成、截面组织,表面形貌和薄膜生长速度均有着显著的影响.
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| 关 键 词： | 功能材料 二氧化钛 激光化学气相沉积 薄膜 |
| 收稿时间： | 2007-03-19 |
| 修稿时间： | 2007-03-19 |
Preparation of Titanium Dioxide Films by Laser Chemical Vapor Deposition Method |
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| SUN Liping,DENG Huiqiu,LIU Xiaozhi,SHE Yanwu,HUANG Feijiang. Preparation of Titanium Dioxide Films by Laser Chemical Vapor Deposition Method[J]. Laser & Optoelectronics Progress, 2007, 44(8): 57-61 |
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| Authors: | SUN Liping DENG Huiqiu LIU Xiaozhi SHE Yanwu HUANG Feijiang |
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| Affiliation: | 1.Department of Electronics and Communication Engineering, Changsha University, Changsha, 410003;2.College of Physics and Micro-Electronic Science, Hunan University, Changsha, 410082 |
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| Abstract: | Rutile TiO2 films and rutile-anatase-mixed TiO2 films were prepared by Laser Chemical Vapor Deposition at laser power between 0 to 200 W and at substrate pre-heating temperature between 400 to 700℃ at the presence of O2. The results showed that the deposited films' crystalline phases, cross-sectional texture, surface morphology and deposition rates were mainly affected by laser power and substrate pre-heating temperature. |
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| Keywords: | functional materials titanium dioxide laser chemical vapor deposition thin films |
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