The adsorption of oxygen on gold

The oxidation of gold has been studied under UHV conditions by AES, XPS, and TDS. The previously reported adsorbed oxygen state, which formed by heating the sample above 600 K in 10^?5 Torr of oxygen and which remained after subsequent heating to 1100 K in vacuo, has been shown to result from the reaction of oxygen with silicon diffusing from the bulk. No oxygen adsorption was detected on a clean sample for oxygen pressures up to 10^?4 Torr and sample temperatures between 300–600 K. Chemisorption of oxygen atoms could be induced by placing a hot platinum filament close to the sample during exposure to oxygen. The activation energy for desorption of this oxygen state was estimated from the thermal desorption spectra to be about 163 kJ mol^?1. The chemisorbed oxygen atoms and the oxygen associated with silicon were distinguished by different O(1s) binding energies (529.2 and 532.3 eV respectively) and by different O(KVV) Auger fine structure.