Desorption of halogens from some Nb,Mo, Ta and W single crystal surfaces

A systematic investigation of the thermal desorption of halogens from well characterized (111), (100) and (110) 4d (Nb, Mo) and 5d (Ta, W) transition metal surfaces has been carried out under low coverage conditions (θ < 10^?2 of a monolayer). Characterization of the surfaces was achieved by LEED, AES and work function determinations while the desorption kinetics were recorded in a large temperature range (1700–2300 K) using a pulsed ionic beam method. The new data concerning some Ta and W surfaces are presented and the results of this systematic study are discussed. It is shown that the halogen desorption parameters, e.g., desorption energies and preexponential factors, are independent of both surface structure and d bond filling of the substrate; E(F) ～4.75 eV, E(Cl) ～4.1 eV, E(Br) ～3.7 eV and τ₀ ～10^?13 ?10^?14 S. The halogen behaviour is compared with that of other adsorbates and with the predictions of a general chemisorption model.