Abstract: | The thermolysis under argon of various polysiloxane resins containing D, T, DH, or TH units was investigated using thermogravimetric analysis combined with mass spectroscopy (TG/MS analysis) and solid-state 29Si-NMR. Redistribution reactions involving the exchange of Si? C/Si? O bonds or Si? H/Si? O bonds were evidenced in addition to the exchange of Si? O/Si? O bonds reported to date. These reactions significantly modify the initial siloxane units and lead to an escape of volatile silanes or siloxanes. The exchange of Si? H/Si? O bonds takes place at lower temperatures (300°C) than the exchange of Si? C/Si? O bonds (500°C). |