Untersuchungen zur Wechselwirkung von Ar-, O2- und H2-Niederdruckplasmen mit Metallschichten

By the interaction of the positiv column of a glow discharge (plasma gases: Ar, O₂, H₂) with the surface of metal films (Au, Ni, Sn) sputtering processes are observed. The sputter yields are larger than will be assumed from known yields of low energetic ions which are dominant in the investigated surface layer. Impulse interaction increases the sputter yields. This effect is reduced to a destruction of metal lattice caused by reconstruction of the surface layer and the inertion of gases during the intervals between the impulses. The sputter yields strongly depend on the plasma gases and the current density directed to the wall (i_W ∼10⁻⁵ A. cm⁻²) it is possible by decreasing the sputter yield to observer reactive processes and gas insertion in consequence of the plasma-wall interaction. Sustained upon electron diffraction of Ni- and Au-films and kinetic analysis of sputter yields a model is developed assuming a critical surface layer of 30–50 Å thickness during the plasma influence in “equilibrium” with a metal vapour-plasma gas phase above it.