首页 | 本学科首页   官方微博 | 高级检索  
     


Dose and pressure dependence of silicon microstructure in SF6 gas due to excimer laser irradiation
Authors:H.R. Dehghanpour  B. Sajad
Affiliation:a Physics Dept., Amirkabir University of Technology, P.O. Box 15875-4413, Tehran, Iran
b Physics Dept., Alzahra University, 1993891176 Tehran, Iran
c Mechanical Eng. Dept., Amirkabir University of Technology, P.O. Box 15875-4413, Tehran, Iran
Abstract:ArF excimer laser radiation on Si surface at controlled SF6 atmosphere creates a microstructure whose alteration at various UV doses and SF6 pressures are investigated in this work. Moreover, a rigorous model has been presented here regarding the experiments based on the micro-fluid mechanical properties of molten silicon layer and the subsequent mechanical wave resonance due to the surface shallow fluid theory. The competitive thermal and non-thermal UV laser interaction with Si and the following heat transfer explains the creation of the self-assembled micro-pillars on Si surface.
Keywords:Si microstructure   ArF laser   Surface wave   Resonance pattern
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号