首页 | 本学科首页   官方微博 | 高级检索  
     


Plasmonic structure generation by laser illumination of silica colloid spheres deposited onto prepatterned polymer-bimetal films
Authors:Á  . Sipos,A. Szalai,M. Gö  rbe,M. Szekeres,M. Csete,I. Dé    ny
Affiliation:a Department of Optics and Quantum Electronics, Dóm tér 9, University of Szeged, Szeged, Hungary
b Department of Colloid Chemistry, Aradi Vértanúk tere 1, University of Szeged, Szeged, Hungary
c HAS Research Group on Laser Physics, Dóm tér 9, University of Szeged, Szeged, Hungary
Abstract:Plasmonic structures are prepared on bimetal films evaporated onto glass substrates applying a multi-step process, and atomic force microscopy is utilized to study the structures after each step. Sub-micrometer gratings are generated on polycarbonate films spin-coated onto silver-gold bimetal layers by interference lithography (IL) applying the fourth harmonics of a Nd:YAG laser. These polymer gratings are used as prepatterned templates in order to deposit silica colloid spheres by spin-coating. It is shown that the conditions of periodic silica sphere-array formation along the template valleys are sufficiently large grating modulation depth, appropriate ratio of silica sphere diameter to grating period, and optimized speed of spinning. The periodic silica sphere arrays are illuminated by a homogeneous KrF excimer laser beam, and periodically arrayed sub-wavelength holes are drilled into bimetal films via colloid sphere lithography (CSL). The characteristic dimensions of the resulted plasmonic structures are defined by the polymer grating period and by the silica colloid sphere diameter. Attenuated total reflection spectroscopy is performed exciting plasmons on different metal-dielectric interfacial structures by the second harmonic of a continuous Nd:YAG laser. The polar and azimuthal angle dependent grating-coupling and scattering effects of the complex periodic structures on the resonance characteristic of plasmons is demonstrated.
Keywords:Interference lithography   Colloid sphere lithography   Plasmonic structure   Grating coupling/scattering
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号