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KrF pulsed laser deposition of La5Ca9Cu24O41 thin films on various substrates
Authors:M. Pervolaraki  G.I. Athanasopoulos  A. Revcolevschi
Affiliation:a Department of Mechanical and Manufacturing Engineering, University of Cyprus, 75 Kallipoleos Avenue, P.O. Box 20537, Nicosia 1678, Cyprus
b Laboratoire de Physico-Chimie de L’Etat Solide, UMR 8182, Université Paris-Sud, 91405 Orsay Cedex, France
Abstract:Recent studies on single crystals of cuprate oxides containing spin chains and ladders have reported large anisotropic magnon-mediated thermal conductivity. A potential use of thin films of such materials could be in the thermal management of electronic devices for the guiding of unwanted heat to a heat sink. In this article, the pulsed laser deposition and characterization of La5Ca9Cu24O41 thin films on SrLaAlO4, SrTiO3, MgO, and Si substrates are reported for the first time. The films were grown using a pulsed UV laser (KrF, 248 nm) and various substrate temperatures up to 650 °C. The XRD spectra revealed successful target-film stoichiometric transfer and high texturing of the thin films with (0 k 0) preferred orientation.
Keywords:La5Ca9Cu24O41   Thin films   Pulsed laser deposition
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