更低温度下和重复再生时NiO/SiO2催化剂上甲苯完全氧化反应

采用原子层沉积法将NiO沉积到粒径约为100 mm、平均孔径为14 nm的中孔SiO2颗粒的壳层(壳层厚度11 nm)区域,并分别在450和600°C进行热处理。将制得的这两种Ni/SiO2样品用于催化甲苯分子吸附及其氧化为CO2的反应中。结果发现,在450°C热处理的样品在甲苯吸附及其随后氧化为CO2的反应中表现出更高的活性；当将该样品暴露在160°C甲苯蒸气中,然后加热到450°C时,排放出CO2,而几乎没有甲苯脱附出来。这表明该催化剂可用于在200°C以下操作的、用于消除建筑物内有味气体的设备中,且该催化剂可以在450°C下经过热处理得到再生。

Use of NiO/SiO2 catalysts for toluene total oxidation:Catalytic reaction at lower temperatures and repeated regeneration

We deposited NiO via atomic layer deposition on mesoporous SiO2 particles with diameters of sev‐eral hundred micrometers and a mean mesopore size of~14 nm. NiO was deposited within the shell region of mesoporous SiO2 particles with a shell thickness of ~11 mm. We annealed the as‐prepared NiO/SiO2 at 450 and 600 °C, respectively. These two samples were used as catalysts for the uptake of toluene molecules and their oxidative conversion to CO2. The sample annealed at 450 °C was generally more reactive in toluene uptake and its subsequent conversion to CO2. When the NiO/SiO2 annealed at 450 °C was exposed to toluene vapor at 160 °C and then heated to 450 °C, CO2 was emitted with almost no toluene desorption. We suggest that our catalysts can be used as building blocks for odor removal devices that operate below 200 °C. These catalysts can be regularly regenerated at~450 °C.