Mesoporous materials from SiO2 and NiTiO3 |
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| Authors: | E. Achhal H. Jabraoui A. Gibaud |
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| Affiliation: | 1. Laboratoire de physique de la matière condensée, Faculté des Sciences Ben M'sik, Université Hassan II Casablanca, Morocco;2. Institut des Molécules et des Matériaux du Maine, Université Maine, France;3. Institut des Molécules et des Matériaux du Maine, Université Maine, France |
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| Abstract: | In this work, we synthesized and characterized mesoporous thin films of SiO2 and NiTiO3 structured by a surfactant called Brij58. These films were fabricated by the method of dip coating and the best conditions for well-structured thin films were investigated as a function of surfactant concentration and different types of substrates. These films have been characterized by X-ray reflectivity which was calculated using the matrix formalism. We demonstrated that the silicon substrate had a great effect on the structure and porosity of the fabricated films for both SiO2 and NiTiO3. Furthermore, we found that mesoporosity has been increased as a function of the surfactant concentration in the solution. This experimental procedure allows also to produce NiTiO3 powders which have been characterized by X-ray diffraction. The XRD coupled to the crystallographic software “Maud”shows that the samples are constituted by 98, 2% NiTiO3 powders. |
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| Keywords: | Mesoporous thin films dip coating brij58 X-ray reflectivity |
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