金刚石膜电化学清洗硅片表面有机沾污的研究

采用金刚石膜电极的电化学方式在专用水基清洗剂中不断产生强氧化剂过氧焦磷酸根离子(P2O4-8),并将此方式作为金刚石膜电化学清洗工艺步骤的第一步,用于氧化去除硅片表面的有机沾污.通过与RCA清洗进行对比实验,并应用X射线光电子谱和原子力显微镜进行清洗效果的检测,结果表明,本清洗工艺处理后的硅片表面有机碳含量更少,微粗糙度小,明显优于现有的RCA清洗工艺.

A Diamond Electrochemical Cleaning Technique for Organic Contaminants on Silicon Wafer Surfaces

Peroxodiphosphate anion (a powerful oxidant) can be formed in a special water-based cleaning agent through an electrochemical reaction on boron-doped diamond electrodes. This electrochemical reaction was applied during the oxi-dation, decomposition, and removal of organic contaminations on a silicon wafer surface, and it was used as the first step in the diamond electrochemical cleaning technique (DECT). The cleaning effects of DECT were compared with the RCA cleaning technique,including the silicon surface chemical composition that was observed with X-ray photoelectron spec- troscopy and the morphology observed with atomic force microscopy. The measurement results show that the silicon sur- face cleaned by DECT has slightly less organic residue and lower micro-roughness, so the new technique is more effective than the RCA cleaning technique.