| 正性远紫外抗蚀剂 Ⅱ.聚苯乙烯砜的荧光光谱研究 |
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| 引用本文： | 杨永源,冯树京,高志民,吴世康. 正性远紫外抗蚀剂 Ⅱ.聚苯乙烯砜的荧光光谱研究[J]. 高分子学报, 1984, 0(6): 414-419 |
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| 作者姓名： | 杨永源 冯树京 高志民 吴世康 |
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| 作者单位： | 中国科学院感光化学研究所(杨永源，冯树京，高志民)，中国科学院感光化学研究所(吴世康) |
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| 摘 要： | 利用荧光光谱研究了聚苯乙烯砜正性远紫外抗蚀剂薄膜和溶液的光氧化反应。发现聚苯乙烯砜的荧光随光照时间的延长而逐步减少。这一现象和在未辐照的聚苯乙烯砜中加入微量的芳香氢过氧化物或羰基化合物时的情况相同。这表明:聚苯乙烯砜经光照后荧光的淬灭和体系光氧化过程中产生了氢过氧化物或羰基化合物有关。这一方法适宜于对高聚物光氧化初始阶段的研究。
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| 收稿时间： | 1982-11-24 |
A POSITIVE DEEP UV PHOTORESIST Ⅱ. A Study of Fluorescence Spectra of Poly (Styrens-Sulfone) |
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| Yang Yong-yuan,Feng Shu-jing,Gao Zhi-min,Wu Shi-kang. A POSITIVE DEEP UV PHOTORESIST Ⅱ. A Study of Fluorescence Spectra of Poly (Styrens-Sulfone)[J]. Acta Polymerica Sinica, 1984, 0(6): 414-419 |
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| Authors: | Yang Yong-yuan Feng Shu-jing Gao Zhi-min Wu Shi-kang |
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| Affiliation: | Institute of Photographic Chemistry; Academia Sinica |
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| Abstract: | The photo-oxidation reaction of poly (styrene-sulfone)-a novel positive deep UV photoresist including film and solution has been studied by fluorescence spectra.The fluorescence intensity of poly (styrene-sulfone) decreased gradually with the duration of exposure. This phenomena was also observed when a trace amount of aromatic hydrogen peroxide or carbonyl compounds introduced to poly (styrene-sulfone) which was without irradiation. It indicated that the quenching of the fluorescence of poly (styrene-sulfone) after irradiation was related with the formation of hydrogen peroxide or carbonyl group during the process of photooxidation. This method,evidently,can be used for studying the starting period of the photo-oxidation of polymers. The mechanism of photooxidation of poly(styrene-sulfone) has been discussed on the basis of this results. |
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