| 碲锌镉晶体高效低损伤CMP工艺研究 |
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| 引用本文： | 李岩,康仁科,高航,吴东江,王可.碲锌镉晶体高效低损伤CMP工艺研究[J].人工晶体学报,2009,38(2):416-421. |
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| 作者姓名： | 李岩 康仁科 高航 吴东江 王可 |
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| 作者单位： | 大连理工大学精密与特种加工教育部重点实验室,大连,116024 |
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| 摘 要： | 本文采用新型的自行研制的化学机械抛光液,对碲锌镉晶体进行了化学机械抛光方法的尝试性试验,并分析了在化学机械抛光(CMP)过程中抛光垫的硬度、磨料的种类、氧化剂、抛光液的pH值对表面质量和材料去除率的影响,提出适合软脆功能晶体碲锌镉的高效低损伤抛光工艺.结果表明,采用自行研制的带有硝酸的化学机械抛光液,在pH优化值为2.5时,15 min即可获得Ra为0.67 nm的超光滑无损伤表面,大大提高了加工效率和精度.
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| 关 键 词： | 碲锌镉 化学机械抛光 抛光垫 氧化剂 |
High-efficiency and Low-damage Chemical Mechanical Polishing Process of CdZnTe Crystals |
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| LI Yan,KANG Ren-ke,GAO Hang,WU Dong-jiang,WANG Ke.High-efficiency and Low-damage Chemical Mechanical Polishing Process of CdZnTe Crystals[J].Journal of Synthetic Crystals,2009,38(2):416-421. |
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| Authors: | LI Yan KANG Ren-ke GAO Hang WU Dong-jiang WANG Ke |
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| Institution: | Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education;Dalian University of Technology;Dalian 116024;China |
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| Abstract: | A novel kind of self-developed chemical mechanical polishing slurry was employed to polish the CZT crystals. The effects of hardness of polishing pad, variety of abrasives, oxidizer and pH value of slurry on the surface quality and materials removal rate of CZT crystals were analyzed, and a kind of optimal process was achieved. The results show that ultra-smooth and damage-free surface with surface roughness Ra of 0.67 nm of CZT crystal is obtained, when the pH value of slurry is 2.5 and polishing duration ... |
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| Keywords: | CdZnTe chemical mechanical polishing polishing pad oxidizer |
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