Abstract: | We introduce a solid-on-solid growth process which evolves by random deposition of dimers, surface diffusion, and evaporation of monomers from the edges of plateaus. It is shown that the model exhibits a robust transition from a smooth to a rough phase. The roughening transition is driven by an absorbing phase transition at the bottom layer of the interface, which displays the same type of critical behavior as the pair contact process with diffusion 2A↦3A, 2A↦. Received 14 October 2002 Published online 14 February 2003 RID="a" ID="a"e-mail: Haye.Hinrichsen@physik.uni-wuppertal.de |