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Impact of substrate injected hot electrons on hot carrier degradation in a 180-nm NMOSFET
Authors:Liang Bin  Chen Jian-Jun  and Chi Ya-Qing
Affiliation:School of Computer Science, National University of Defense Technology, Changsha 410073, China
Abstract:substrate hot electron injection, hot carrier injection (HCI) degradation, interface trap, oxidetrapped charge
Keywords:substrate hot electron injection   hot carrier injection (HCI) degradation   interface trap   oxidetrapped charge
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