掺氮四配位非晶碳薄膜的拉曼光谱和表面形貌

采用磁过滤真空溅射离子沉积技术,用氩气和氮气共溅射石墨靶,在不同氮气分压下,制备了一组不同氮含量的四配位非晶碳薄膜(ta-C:N).用X射线光电子能谱确定ta-C:N薄膜中的氮含量;研究了氮含量对ta-C薄膜的拉曼光谱和表面形貌的影响.结果表明:不含氮的ta-C薄膜的拉曼光谱是中心在1580cm-1、范围从1200cm-1至2000cm-1的类高斯峰,表面均匀光滑;含氮的ta-C:N薄膜,其拉曼光谱分裂为1360 cm-1的D带和1580 cm-1的G带,且D带与G带的最大强度比, 以及薄膜的表面粗糙度随氮含量的增加而增大.最后讨论了氮含量对ta-C薄膜的微结构的影响.

Raman Spectra and Surface Morphology of Nitrogen-doping Tetrahedral Amorphous Carbon Films

Nitrogen-containing tetrahedral amorphous carbon films (ta-C) have been prepared by magnetic field filtered plasma stream deposition method. The plasma stream was first formed by sputtering of a graphite target in nitrogen-argon atmosphere. The microstructure and surface morphology of the films having different nitrogen-doping levels have been studied using X-ray photoelectron spectroscopy (XPS), Raman spectroscopy and atomic force microscopy. The results showed that the nitrogen-free ta-C films have a single and nearly symmetric very broad Raman peak range from 1200 cm-1 to 2000 cm-1 with the centerline at about 1580 cm-1. The surface morphology of the films is very smooth and uniform. The Raman spectra of nitrogen-containing ta-C films exhibit two broad peaks centered approximately at 1360 cm-1 (D peak) and 1580 cm-1 (G peak). The ratio of the maximum intensity of D band and G band increases with the amount of nitrogen incorporated into ta-C films. The correlation between microstructure and nitrogen content in these films was discussed.