Paramagnetic defects induced by ion implantation in oxide glasses

Radiation defects induced by ion bombardment of multicomponent oxide glasses of five compositions (phosphates and borosilicates) were investigated by means of electron paramagnetic resonance (EPR). The samples were implanted with N⁺, O⁺, Ar⁺, Mn⁺, Cu⁺ and Pb⁺ ions at energy E=150 keV at three different doses between 3×10¹⁵ and 10¹⁷ ions/cm². The broad anisotropic EPR spectra with principal g-values answering the relationship g_z>g_y>g_x˜g_e (g_e is g-factor of free electron) were observed for the samples of all five compositions. The g-values depend on glass composition. For example, g_z ranges from 2.016 to 2.057. Computer simulation shows that the spectra of many samples are superpositions of two spectra with g-values answering the mentioned relationship. These spectra are attributed to molecular O₂⁻ ions weakly coupled with glass network. In some samples narrow almost symmetric lines with g=2.0025±0.0005 were observed. The possible radiation defects responsible for this signal are discussed.