| 倒锥形抗反射表面微结构的构筑 |
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| 引用本文： | 郝娟婷,何大澄,郝娟媛.倒锥形抗反射表面微结构的构筑[J].高等学校化学学报,2012,33(2):361-364. |
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| 作者姓名： | 郝娟婷 何大澄 郝娟媛 |
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| 作者单位： | 1. 北京师范大学细胞增殖与调控教育部重点实验室, 北京 100875;
2. 吉林大学化学学院, 超分子结构与材料国家重点实验室, 长春 130012 |
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| 基金项目： | 国家自然科学基金，国家"九七三"计划项目 |
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| 摘 要： | 利用Langmuir-Blodgett(LB) 技术在单晶硅表面转移岛状硬脂酸单层膜图案, 通过各向异性的湿法刻蚀构筑倒锥形表面微结构. 倒锥形结构的深度及表面抗反射性能主要与刻蚀的时间有关. 这种方法结合了自组装面积大和湿法刻蚀成本低的优点, 是一种廉价、高效的制备大面积抗反射微结构的方法, 在降低光学器件和太阳能电池的成本方面具有潜在应用价值.
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| 关 键 词： | LB单层膜 倒锥形微结构 单晶硅 抗反射 |
| 收稿时间： | 2011-04-13 |
Fabrication of Inverted Pyramidal Microstructures with Antireflective Properties |
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| HAO Juan-Ting
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HE Da-Cheng
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HAO Juan-Yuan.Fabrication of Inverted Pyramidal Microstructures with Antireflective Properties[J].Chemical Research In Chinese Universities,2012,33(2):361-364. |
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| Authors: | HAO Juan-Ting HE Da-Cheng HAO Juan-Yuan |
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| Institution: | 1. Key Laboratory of Cell Proliferation and Regulation, Ministry of Education, Beijing Normal University, Bejing 100875, China;
2. State Key Laboratory of Supramolecular Structure and Materials, College of Chemistry, Jilin University, Changchun 130012, China |
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| Abstract: | The inverted pyramidal microstructures were fabricated by anisotropic wet etching on the domain structure patterned Si substrate,which was obtained by transferring stearic acid monolayer onto Si substrate via Langmuir-Blodgett(LB) technique.The height of inverted pyramidal structures and the antireflective properties were mainly dependent on etching duration.This method combines the simplicity and scalability of self-assembly and low cost of chemical etching.It is an inexpensive and effective method to fabricate antireflective surface over large area,which has potential applications on reducing the cost of optical devices and solar cells. |
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| Keywords: | LB monolayer Inverted pyramidal microstructure Single crystal silicon Antireflection |
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