首页 | 本学科首页   官方微博 | 高级检索  
     


Apparent dewetting of ultrathin multilayered polyelectrolyte films incubated in aqueous environments
Authors:Zhang Jingtao  Fredin Nathaniel J  Lynn David M
Affiliation:Department of Chemical and Biological Engineering, University of Wisconsin-Madison, 1415 Engineering Drive, Madison, Wisconsin 53706, USA.
Abstract:We have investigated and characterized changes in film morphology and surface structure that occur when ultrathin multilayered polyelectrolyte films fabricated from linear poly(ethylene imine) (LPEI), sodium poly(styrene sulfonate) (SPS), and two hydrolytically degradable polyamines (polymers 1 and 2) are incubated in physiologically relevant environments. Characterization of the physical erosion profiles of films having the structure (LPEI/SPS)10(1/SPS)4(2/SPS)4 (approximately 80 nm thick) by atomic force microscopy (AFM), reflective optical microscopy, and scanning electron microscopy (SEM) demonstrated that these materials undergo large-scale changes in surface structure and morphology upon incubation in phosphate-buffered saline (PBS) at 37 degrees C. The patterns and structures generated during this transformation (e.g., nucleation and growth of holes, coalescence of holes, formation of cell-type structures, and the subsequent breakup of these features into droplets) are similar in many ways to those observed for the dewetting of thin films of conventional polymers, such as polystyrene, on nonwetting surfaces. The processes reported here are sufficiently slow (they occur over approximately 100 h) and occur under sufficiently mild conditions (e.g., incubation in PBS at 37 degrees C) to permit characterization and quantification of the structures and features that arise during the course of these transformations. The apparent dewetting of these ultrathin films upon exposure to aqueous environments creates future opportunities to investigate and characterize processes of mass transport in this class of ionically cross-linked assemblies.
Keywords:
本文献已被 PubMed 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号