The use of silicon in the preparation of apolar glass capillary columns

As an extention of previous reports, variables affecting the performance of columns modified by silicon deposition have been optimized. The aim of this work was to produce thermostable apolar glass capillary columns regardless of the glass type used and to maintain column performance under stressful conditions. The main parameters studied were the influence of glass type, leaching effects, and silicon layer thickness on column activity. Deactivation and stationary phase conditions were held constant. Both coated and uncoated columns were tested. The thickness of the silicon layer was found to be relatively unimportant. There was no difference whether soft glass or borosiiicate glass was used and leaching before silicon deposition did not influence column activity. Bare silicon surfaces showed considerable activity especially in respect to interactions with free acids and bases. There are indications that the surface consists of silicon oxide and other oxygenated forms of silicon rather than of the element. Treatment of the silicon layers with dilute hydrofluoric acid and the strict exclusion of traces of oxygen and water did not improve the situation. In spite of such specific interactions, silicon surfaces were easily deactivated by heat treatment with polysiloxanes. Silicon surfaces deactivated by baking with octamethyltetrasiloxane at 400°C are inert and temperature stable and show characteristics similar to persilylated surfaces.