Optical metamaterials at near and mid-IR range fabricated by nanoimprint lithography |
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| Authors: | W Wu E Kim E Ponizovskaya Y Liu Z Yu N Fang YR Shen AM Bratkovsky W Tong C Sun X Zhang S-Y Wang RS Williams |
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| Institution: | (1) Quantum Science Research, Hewlett-Packard Laboratories, Palo Alto, CA 94304, USA;(2) Department of Physics, University of California, Berkeley, CA 94720, USA;(3) NSF Nano-scale Science and Engineering Center (NSEC), University of California, Berkeley, CA 94720, USA;(4) Department of Mechanical & Industrial Engineering, University of Illinois, Urbana-Champagne, IL 61801, USA |
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| Abstract: | Two types of optical metamaterials operating at near-IR and mid-IR frequencies, respectively, have been designed, fabricated
by nanoimprint lithography (NIL), and characterized by laser spectroscopic ellipsometry. The structure for the near-IR range
was a metal/dielectric/metal stack “fishnet” structure that demonstrated negative permittivity and permeability in the same
frequency region and hence exhibited a negative refractive index at a wavelength near 1.7 μm. In the mid-IR range, the metamaterial
was an ordered array of fourfold symmetric L-shaped resonators (LSRs) that showed both a dipole plasmon resonance resulting
in negative permittivity and a magnetic resonance with negative permeability near wavelengths of 3.7 μm and 5.25 μm, respectively.
The optical properties of both metamaterials are in agreement with theoretical predictions. This work demonstrates the feasibility
of designing various optical negative-index metamaterials and fabricating them using the nanoimprint lithography as a low-cost,
high-throughput fabrication approach.
PACS 42.25.Bs; 81.16.Nd; 42.70.-a; 81.07.-b |
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