| 用于非球面测试的位相型计算全息图制作 |
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| 引用本文： | 马杰,朱效立,谢常青,叶甜春,赵珉,刘明,陈宝钦,朱日宏,高志山,马骏. 用于非球面测试的位相型计算全息图制作[J]. 微细加工技术, 2008, 0(6) |
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| 作者姓名： | 马杰 朱效立 谢常青 叶甜春 赵珉 刘明 陈宝钦 朱日宏 高志山 马骏 |
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| 作者单位： | 1. 中国科学院微电子研究所,北京,100029
2. 南京理工大学光学工程系,南京,210094 |
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| 基金项目： | 国家重点基础研究发展规划(973计划)，中国高技术发展研究计划 |
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| 摘 要： | 本文对计算全息图元件的设计和制作成算法和软件,研究了采用高速电子束直写系统制作大面积、非周期性复杂光刻图形技术,在此工作的基础上,采用湿法腐蚀铬、感应耦合等离子体刻蚀石英玻璃两步图形转移的方案,制作出了图形区直径为64 mm、最外环线条宽度为2.0μm、刻蚀深度为690 nm的位相型计算全息图元件,并对加工结果进行了测量.结果表明,本方案所制作的计算全息图元件具有良好的加工质量,符合应用的需求.
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| 关 键 词： | 非球面测试 计算全息图 电子束光刻 湿法腐蚀 感应耦合等离子体刻蚀 |
Fabrication of Phase-type Computer-generated Holograms for Aspheric Surface Test |
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| MA Jie,ZHU Xiao-li,XIE Chang-qing,YE Tian-chun,ZHAO Min,LIU Ming,CHEN Bao-qin,ZHU Ri-hong,GAO Zhi-shan,MA Jun. Fabrication of Phase-type Computer-generated Holograms for Aspheric Surface Test[J]. Microfabrication Technology, 2008, 0(6) |
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| Authors: | MA Jie ZHU Xiao-li XIE Chang-qing YE Tian-chun ZHAO Min LIU Ming CHEN Bao-qin ZHU Ri-hong GAO Zhi-shan MA Jun |
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| Affiliation: | MA Jie1,ZHU Xiao-li1,XIE Chang-qing1,YE Tian-chun1,ZHAO Min1,LIU Ming1,CHEN Bao-qin1,ZHU Ri-hong2,GAO Zhi-shan2,MA Jun2(1.Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029,China,2.Department of Optical Engineering,Nanjing University of Science , Technology,Nanjing 210094,China) |
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| Abstract: | The design principle of computer-generated-holograms(CGHs) was introduced and the key fabrication technique was studied.Algorithms and software for the generation of CGH lithography patterns were developed independently and the technique for fabricating large-area,nonperiodical,complex lithography patterns employing high-speed electron beam lithography system was studied.With additional processes of wet etching of chrome and ICP etching of fused silica,the phase-type CGH with a diameter of 64 mm,an outermos... |
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| Keywords: | aspheric surface test computer-generated hologram electron-beam lithography wet etching inductively coupled plasma etching |
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