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Fabrication of black multicrystalline silicon surface by nanosecond laser ablation |
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| Authors: | D A Zuev O A Novodvorsky E V Khaydukov O D Khramova A A Lotin L S Parshina V V Rocheva V Y Panchenko V V Dvorkin A Y Poroykov G G Untila A B Chebotareva T N Kost M A Timofeyev |
| Institution: | 1. Institute on Laser and Information Technologies, Russian Academy of Sciences (ILIT RAS), 1 Svyatoozerskaya St., 140700, Shatura, Moscow Region, Russia 2. Skobeltsyn Institute of Nuclear Physics (MSU SINP), Lomonosov Moscow State University, 1(2), Leninskie gory, GSP-1, Moscow, 119991, Russia |
| Abstract: | The optimal regimes for uniform texturing of a multicrystalline silicon (mc-Si) surface by pulsed laser radiation have been determined. The morphology and reflectance spectra of the texturized mc-Si have been studied. The laser-texturized mc-Si samples with reflectance of 2?C3% over a wide spectral region have been produced. The influence of subsequent chemical etching on the reflective properties of the texturized surface has been analyzed. |
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