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Interlayer exchange coupling dependence of thermal stability parameters in synthetic antiferromagnetic free layers |
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| Authors: | Y. Saito H. Sugiyama T. Inokuchi K. Inomata |
| Affiliation: | 1. Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan;2. Department of Material Science, Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan;3. CREST-JST, Kawaguchi, Saitama 332-0012, Japan |
| Abstract: | |
| Keywords: | 85.75.&minus d 75.60.Nt 73.40.Gk 75.47.&minus m |
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