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Development of vapor phase decomposition-total-reflection X-ray fluorescence spectrometer |
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| Authors: | Motoyuki Yamagami Akihiro Ikeshita Yoshinobu Onizuka Shinjiro Kojima Takashi Yamada |
| Institution: | a X-ray Research Laboratory, Rigaku Corporation, 14-8 Akaoji, Takatsuki, Osaka 569-1146, Japan b Rigaku Industrial Corporation, 14-8 Akaoji, Takatsuki, Osaka 569-1146, Japan |
| Abstract: | A total reflection X-ray fluorescence spectrometer integrated with vapor phase decomposition, VPD-TXRF, was newly developed. This instrument was designed to achieve a minimum footprint, to avoid cross contamination during operation, and to protect people and instruments from HF gas. Comparisons between analysis by VPD-TXRF and by atomic absorption spectrometry (AAS) indicated very good agreement in a wide range, from 108 to 1012 atoms/cm2. The lower limits of detection (LLDs) were improved by two orders of magnitude compared with straight TXRF. For 300-mm Si wafers, the LLDs were 5×108 atoms/cm2 and 1×107 atoms/cm2 for Al and Ni, respectively. VPD-TXRF was able to perform ultra-trace analysis at the level of 108 atoms/cm2. |
| Keywords: | Total-reflection X-ray fluorescence (TXRF) Vapor phase decomposition (VPD) Metal contamination Silicon wafer Metrology tool |
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