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Dielectric properties of Ta2O5 films grown on silicon substrates plasma nitrided in N2O |
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| Authors: | N. Novkovski E. Atanassova |
| Affiliation: | (1) Institute of Physics, Faculty of Natural Sciences and Mathematics, Gazibaba b.b., 1000 Skopje, Macedonia;(2) Institute of Solid State Physics, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee blvd., 1784 Sofia, Bulgaria |
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