Improving Beamline X-ray Optics by Analyzing the Damage to Crystallographic Structure |
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| Authors: | John Zientek Jozef Maj Gary Navrotski George Srajer Charles Harmata Lech Maj |
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| Institution: | 1. Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois, USA;2. Yale University, New Haven, Connecticut, USA |
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| Abstract: | The mission of the X-ray Characterization Laboratory in the X-ray Science Division (XSD) at the Advanced Photon Source (APS) is to support both the users and the Optics Fabrication Facility that produces high-performance optics for synchrotron X-ray beamlines. The Topography Test Unit (TTU) in the X-ray Lab has been successfully used to characterize diffracting crystals and test monochromators by quantifying residual surface stresses. This topographic method has also been adapted for testing standard X-ray mirrors, characterizing concave crystal optics and, in principle, can be used to visualize residual stresses on any optic made from single crystalline material. |
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