|
|||||
|
|
| 热化学气相沉积法制备定向碳纳米管薄膜 | |
| 引用本文： | 刘长虹,程国安,艾云龙. 热化学气相沉积法制备定向碳纳米管薄膜[J]. 南昌大学学报(理科版), 2005, 29(1): 54-58 |
| 作者姓名： | 刘长虹 程国安 艾云龙 |
| 作者单位： | 1. 南昌航空工业学院,材料科学与工程系,江西,南昌,330034;南昌大学,材料科学与工程系,江西,南昌,330047 2. 北京师范大学,低能核物理研究所,北京,100875;南昌大学,材料科学与工程系,江西,南昌,330047 3. 南昌航空工业学院,材料科学与工程系,江西,南昌,330034 |
| 基金项目： | 国家自然科学基金资助项目(10275005) |
| 摘 要： | 采用热化学气相沉积法(CVD)，以乙炔为碳源，在单晶硅上制备了定向碳纳米管薄膜。通过扫描电子显微镜(SEM)观察了碳管薄膜及衬底表面形貌。结果表明，以多孔硅为衬底生长的碳纳米管管径均匀且离散分布，定向性良好。生长前氨对催化剂膜的预处理具有刻蚀作用，可显著提高碳管的生长密度，从而获得碳纳米管阵列膜。 |
| 关 键 词： | 碳纳米管薄膜 热CVD 定向 氨预处理 |
| 文章编号： | 1006-0464(2005)01-0054-05 |
| 修稿时间： | 2003-07-23 |
PREPARATION OF ALIGNED CARBON NANOTUBES FILMS BY THERMAL CHEMICAL VAPOR DEPOSITION |
|
| LIU Chang-hong,CHENG Guo-an,AI Yun-long. PREPARATION OF ALIGNED CARBON NANOTUBES FILMS BY THERMAL CHEMICAL VAPOR DEPOSITION[J]. Journal of Nanchang University(Natural Science), 2005, 29(1): 54-58 | |
| Authors: | LIU Chang-hong CHENG Guo-an AI Yun-long |
| Affiliation: | LIU Chang-hong~ |
| Abstract: | Carbon nanotubes films grown on single-crystal silicon by thermal chemical vapor deposition using acetylene gas as carbon source were prepared. The morphology of carbon nanotubes films and surface of substrates were examined by scanning electron microscope (SEM). The results show that carbon nanotubes grown on porous silicon substrate are well aligned with uniform diameter and dispersed distribution. Ammonia pretreatment to catalyst films is an etching process that increases the growth density of carbon nanotubes, and hence carbon nanotubes array films can be obtained. |
| Keywords: | CNTs films thermal CVD align ammonia pretreatment |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ | |