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Analysis of Ti-N films by calibration of Ti X-ray spectra |
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| Authors: | F Stobiecki T Stobiecki F Kellner K Thoma K Röll and H Gärtner |
| Institution: | (1) FB Physik, Gesamthochschule — Universität Kassel, W-3500 Kassel, Federal Republic of Germany;(2) Present address: Institute of Molecular Physics, Polish Academy of Sciences, ul. Smoluchowskiego 17, PL-60-179 Poznan, Poland;(3) Present address: Institute of Electronics, Department of Physics and Electron Technology, Academy of Mining and Metallurgy, al. Mickiewicza 30, PL-30-059 Kraków, Poland |
| Abstract: | Summary An energy-dispersive X-ray analysis of Ti1–xNx films was performed by using an Si(Li) detector. The Ti1–xNx films were sputtered on polished steel substrates in a mixed Ar+N2 atmosphere by a reactive magnetron sputtering technique. Because the nitrogen X-ray line is absorbed by the Be window, an analysis method was developed based solely on the calibration of the characteristic Ti-K -intensities using a high-purity Ti standard. The film compositions were computed by means of a ZAF procedure. The samples closest to stoichiometric composition show maximum hardness. |
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