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Ar plasma treated and Al metallised polycarbonate: a XPS, mass spectroscopy and SFM study
Authors:C Seidel  H Kopf  B Gotsmann  T Vieth  H Fuchs  K Reihs
Institution:

a Physikalisches Institut, Universität Münster, D-48149 Münster, Germany

b Bayer, Zentrale Forschung und Entwicklung, D-51368 Leverkusen, Germany

Abstract:Ar plasma etched and Al metallised bisphenol A carbonate was analysed by mass spectroscopy, photoelectron spectroscopy (XPS), and scanning force microscopy (SFM). We mainly used a technical polymer (Makrolon 2808, Bayer) made by injection-moulding, as well as spin coated bisphenol A carbonate (n=1) and polycarbonate (PC) (n=115). The mass spectroscopy during the etching process shows the degradation of the PC in the form of carbon monoxide, carbon dioxide and methyl groups. The photoelectron spectroscopy shows in detail the surface modification after Ar plasma treatment and metallisation. The plasma induces a reduction of the carboxylic carbon (C 1s), a strong reduction of singly bonded oxygen (O 1s) and also a slight reduction of doubly bonded oxygen. After Al metallisation, a reaction of Al with the oxygen groups and an interaction with the aromatic system is documented. Ar plasma etching increases the chemical interaction of Al mainly with the aromatic carbon. The X-ray photoelectron spectroscopy of metallised PC under different initial conditions shows a strong influence of incorporated water in the PC bulk that cannot be seen by XPS on uncoated PC. The O 1s signal increases during metallisation and results in an oxidation of Al probably caused by the fact that the hydrophobic surfaces becomes hydrophillic. Temperature-dependent XPS was done on technical PC samples and on spin coated samples (n=1, n=115) and supports the influence of the bulk state for the Al–PC interface. For n=1 carbonate, a diffusion of Al into the PC volume was observed. The SFM measurements showed a roughening effect on the nanometer scale even after short treatment times. Al can be seen as a weakly bound cluster on the virgin PC, and if a pre-etching is done, Al seems to grow as a good wetting film. The adhesion force of Al films on PC without any influence of the volume can be explained by the chemical bonding of Al to the carboxylic and aromatic systems. The adhesion can be increased by plasma pre-treatment. A breakdown of the adhesion on technical PC is probably induced by a reaction of Al with mobile intercalated gas, that is enriched near the surface after Al coating.
Keywords:Polycarbonate  Ar  Plasma  XPS  SFM  Mass spectroscopy
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