Analytics of hard amorphous silicon containing PECVD-coatings |
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| Authors: | R. Heyner, S. Mä nnel G. Marx |
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| Affiliation: | (1) Department of Chemistry, Technical University Chemnitz-Zwickau, D-09009 Chemnitz, Germany |
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| Abstract: | The present communication deals with investigations of  -SiC(N,O):H thin films produced by DC-plasma enhanced chemical vapor deposition under high power conditions. In contrast to traditional processes liquid precursors (hexamethyldisiloxane-HMDSO, hexamethyldisilazane-HMDSN), diluted in argon or nitrogen have been used for the decomposition in the glow discharge. |
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